Systems and methods for measuring one or more characteristics of patterned features on a specimen
US7463369B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2006 |
| Grant date | Dec 9, 2008 |
| Priority date | — |
| Expiry date | Mar 1, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/4792
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for measuring one or more characteristics of patterned features on a specimen are provided. One system includes an optical subsystem configured to acquire measurements of light scattered from the patterned features on the specimen at multiple angles of incidence, multiple azimuthal angles, and multiple wavelengths simultaneously. The system also includes a processor configured to determine the one or more characteristics of the patterned features from the measurements. One method includes acquiring measurements of light scattered from the patterned features on the specimen at multiple angles of incidence, multiple azimuthal angles, and multiple wavelengths simultaneously. The method also includes determining the one or more characteristics of the patterned features from the measurements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.