Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography
US7463402B2 · kind B2 · utility
1Cited by
23References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2006 |
| Grant date | Dec 9, 2008 |
| Priority date | — |
| Expiry date | Jul 5, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.