Patent · US Active

Reticle alignment and overlay for multiple reticle process

US7465525B2 · kind B2 · utility

4Cited by

26References

17Claims

0Family size

Assignee

Lam Research Corporation · US

Inventors

S. M. Reza Sadjadi · Saratoga, US
Nicolas Bright · Saratoga, US

Key dates

Filing date	May 10, 2005
Grant date	Dec 16, 2008
Priority date	—
Expiry date	Feb 9, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70466
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for generating a plurality of reticle layouts is provided. A feature layout with a feature layout pitch is received. A plurality of reticle layouts is generated from the feature layout where each reticle layout of the plurality of reticle layouts has a reticle layout pitch and where each reticle layout pitch is at least twice the feature layout pitch.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.