Nicolas Bright
41Patents
11h-index
47Co-inventors
75Inventor score
Filing activity: Dec 2, 1992 → Feb 28, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5350479A | Electrostatic chuck for high power plasma processing | Emerging Cross-Sectional Technologies | 149 | Expired |
| US5477975A | Plasma etch apparatus with heated scavenging surfaces | Emerging Cross-Sectional Technologies | 63 | Expired |
| US6251770A | Dual-damascene dielectric structures and methods for making the same | Electricity | 56 | Expired |
| US6322661A | Method and apparatus for controlling the volume of a plasma | Electricity | 56 | Expired |
| US5770099A | Plasma etch apparatus with heated scavenging surfaces | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6095741A | Dual sided slot valve and method for implementing the same | Emerging Cross-Sectional Technologies | 33 | Expired |
| US5539609A | Electrostatic chuck usable in high density plasma | Electricity | 32 | Expired |
| US5583737A | Electrostatic chuck usable in high density plasma | Electricity | 32 | Expired |
| US6194325A | Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography | Electricity | 24 | Expired |
| US6808590B1 | Method and apparatus of arrayed sensors for metrological control | Physics | 12 | Expired |
| US6267545A | Semiconductor processing platform architecture having processing module isolation capabilities | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6929531B2 | System and method for metal residue detection and mapping within a multi-step sequence | Electricity | 11 | Expired |
| US7521358B2 | Process integration scheme to lower overall dielectric constant in BEoL interconnect structures | Electricity | 6 | Active |
| US6083412A | Plasma etch apparatus with heated scavenging surfaces | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7309618B2 | Method and apparatus for real time metal film thickness measurement | Electricity | 6 | Expired |
| US7152011B2 | Smart component-based management techniques in a substrate processing system | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7084621B2 | Enhancement of eddy current based measurement capabilities | Physics | 5 | Expired |
| US7010468B2 | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection | Electricity | 5 | Expired |
| US7465525B2 | Reticle alignment and overlay for multiple reticle process | Physics | 4 | Active |
| US6859765B2 | Method and apparatus for slope to threshold conversion for process state monitoring and endpoint detection | Electricity | 4 | Expired |
| US6984162B2 | Apparatus methods for controlling wafer temperature in chemical mechanical polishing | Performing Operations; Transporting | 3 | Expired |
| US7539969B2 | Computer readable mask shrink control processor | Physics | 3 | Expired |
| US7060605B2 | Methods for making dual-damascene dielectric structures | Electricity | 3 | Expired |
| US6909190B2 | Dual-damascene dielectric structures | Electricity | 3 | Expired |
| US6951624B2 | Method and apparatus of arrayed sensors for metrological control | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.