Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
US7476876B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 21, 2005 |
| Grant date | Jan 13, 2009 |
| Priority date | — |
| Expiry date | Nov 25, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24578
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An angle measurement system for measuring angles of incidence for ion beams during ion implantation includes a varied angle slot array and an array of charge measurement devices located downstream of the varied angle slot array. The varied angle slot array includes slots formed within a structure from an entrance surface to an exit surface. Each of the slots has a varied acceptance angle range. The array of charge measurement devices are individually associated with the slots and can measure charge or beam current for beamlets that pass through the slots. These measurements and the varied or different acceptance angle ranges can then be employed to determine a measured angle of incidence and/or angular content for an ion beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.