Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program
US7480028B2 · kind B2 · utility
1Cited by
3References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 2, 2005 |
| Grant date | Jan 20, 2009 |
| Priority date | — |
| Expiry date | Mar 2, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7076
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention is directed to enabling substrate identification by comparing the measured distance between two features on an unidentified substrate with one or more stored distances. The one or more stored distances are the distances intended during the design of one or more substrates. The unidentified substrate is identified by a stored distance that corresponds to the measured distance. The two features are selected from a plurality of features that may be placed on a back side or a front side of a substrate. An optical system is provided for reading the features from the back side or a front side of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.