Exposure apparatus and method for manufacturing device
US7480029B2 · kind B2 · utility
18Cited by
12References
49Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 30, 2005 |
| Grant date | Jan 20, 2009 |
| Priority date | — |
| Expiry date | Sep 30, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/42
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus wherein an image of a pattern is projected onto a substrate via a projection optical system to expose the substrate, includes: a substrate moving device that is movable while holding the substrate above the projection optical system; and a liquid immersion unit that fills at least a portion of the space between the projection optical system and the substrate with a liquid, wherein the image of the pattern is projected onto the substrate via the projection optical system and the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.