Lithographic system, sensor, and method of measuring properties of a substrate
US7480050B2 · kind B2 · utility
8Cited by
28References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2006 |
| Grant date | Jan 20, 2009 |
| Priority date | — |
| Expiry date | May 4, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/4714
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sensor measuring properties of a substrate in which radiation is projected onto the substrate by a radiation projector that has a first part configured such that the radiation projection can project onto the substrate linearly polarized radiation oriented in a first direction and a second part configured such that the radiation projector can project onto the substrate linearly polarized radiation oriented in a second direction orthogonal to the first direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.