Apparatus and methods for improving the stability of RF power delivery to a plasma load
US7480571B2 · kind B2 · utility
80Cited by
10References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2004 |
| Grant date | Jan 20, 2009 |
| Priority date | — |
| Expiry date | Oct 15, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods for improving the stability of RF power delivery to a plasma load are disclosed. The method includes adding an RF resistor and/or a power attenuator at one of many specific locations in the RF power system to lower the impedance derivatives while keeping the matching circuit substantially in tune with the RF transmission line.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.