Lithographic apparatus and device manufacturing method
US7482611B2 · kind B2 · utility
51Cited by
24References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 9, 2006 |
| Grant date | Jan 27, 2009 |
| Priority date | — |
| Expiry date | Mar 9, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.