Imaging device in a projection exposure machine

US7486382B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Stephan Back · Langenau, DE
• Wolfgang Hummel · Dresden, DE
• Juergen Fischer · Adelsheim, DE
• Karl-Eugen Aubele · Geislingen an der Steige, DE
• Erich Merz · Oberkochen, DE
• Raoul Reiner · Pforzheim, DE
• Klaus Rief · Aalen, DE
• Stefan Schoengart · Ulm, DE
• Markus Neumaier · Langenau, DE
• Baerbel Schwaer · Aalen, DE
• Ulrich Weber · Ulm, DE
• Michael Muehlbeyer · Aalen, DE
• Hubert Holderer · Oberkochen, DE
• Alexander Kohl · Aalen, DE
• Jochen Weber · Laufenbürg, DE
• Johannes Lippert · Buch am Wald, DE
• Thorsten Rassel · Wertingen, DE

Key dates

• Filing date: Dec 21, 2005
• Grant date: Feb 3, 2009
• Expiry date: May 30, 2027

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70258
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.