Lithographic support structure
US7486384B2 · kind B2 · utility
Assignee
Inventors
- Patricius Aloysius Jacobus Tinnemans
- Edwin Johan Buis
- Sjoerd Nicolaas Lambertus Donders
- Jan Van Elp
- Jan Frederik Hoogkamp
- Aschwin Lodewijk Hendricus Johannes Van Meer
- Patrick Johannes Cornelus Hendrik Smulders
- Franciscus Andreas Cornelis Johannes Spanjers
- Johannes Petrus Martinus Bernardus Vermeulen
- Raimond Visser
- Henricus Gerardus Tegenbosch
- Johannes Charles Adrianus Van Den Berg
- Henricus Johannes Adrianus Van De Sande
- Thijs Vervoort
Key dates
| Filing date | Mar 31, 2004 |
| Grant date | Feb 3, 2009 |
| Priority date | — |
| Expiry date | Jul 28, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02N13/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.