Method for preparing solid precursor tray for use in solid precursor evaporation system

US7488512B2 · kind B2 · utility

Assignee

• TOKYO ELECTRON LIMITED · JP

Inventors

• Kenji Suzuki · Musashino, JP
• Emmanuel Guidotti · Gilbert, US
• Gerrit J. Leusink · Albany, US
• Masamichi Hara · Albany, US
• Daisuke Kuroiwa · Clifton Park, US
• Sandra G. Malhotra · San Jose, US
• Fenton R. McFeely · Ossining, US
• Robert R. Young · Poestenkill, US

Key dates

• Filing date: Dec 9, 2004
• Grant date: Feb 10, 2009
• Expiry date: Jan 4, 2027

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/16
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

In a solid precursor evaporation system configured for use in a thin film deposition system, such as thermal chemical vapor deposition (TCVD), a method for preparing one or more trays of solid precursor is described. The solid precursor may be formed on a coating substrate, such as a tray, using one or more of dipping techniques, spin-on techniques, and sintering techniques.