Lithographic apparatus and device manufacturing method
US7492440B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 9, 2004 |
| Grant date | Feb 17, 2009 |
| Priority date | — |
| Expiry date | Apr 27, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.