Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
US7493589B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 1, 2006 |
| Grant date | Feb 17, 2009 |
| Priority date | — |
| Expiry date | Apr 30, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a) segmenting a plurality of the features into a plurality of polygons; (b) determining the image log slope (ILS) value for each of the plurality of polygons; (c) determining the polygon having the minimum ILS value, and defining a mask containing the polygon; (d) convolving the mask defined in step (c) with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and (e) assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multi-exposure process the polygon is assigned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.