Apparatus for determining a temperature of a substrate and methods therefor
US7497614B2 · kind B2 · utility
452Cited by
8References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 27, 2007 |
| Grant date | Mar 3, 2009 |
| Priority date | — |
| Expiry date | Jul 27, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K11/3213
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for measuring a temperature of a substrate is disclosed. The apparatus includes a phosphor material in direct contact with the substrate and in thermal contact with the substrate, the phosphor material producing a fluorescent response in a first wavelength range when exposed to a electromagnetic radiation in a second wavelength range, the fluorescent response decaying at a decay rate that is related to a temperature of the phosphor material, and the phosphor material producing a first set of non volatile byproducts when expose to a plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.