Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
US7502103B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 31, 2006 |
| Grant date | Mar 10, 2009 |
| Priority date | — |
| Expiry date | Sep 18, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70766
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, at least one sensor constructed and arranged to measure a parameter of the substrate, a displacement system to displace one of the substrate table and sensor with respect to the other one of the substrate table and sensor in at least a first direction, a first balance mass, and a first bearing which movably supports the first balance mass so as to be substantially free to translate in the opposite direction of the first direction in order to counteract a displacement of the one of the substrate table and sensor in the first direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.