Device manufacturing method and device
US7507675B2 · kind B2 · utility
19Cited by
1References
13Claims
0Family size
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Key dates
| Filing date | Jun 24, 2004 |
| Grant date | Mar 24, 2009 |
| Priority date | — |
| Expiry date | Jun 24, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/809
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for patterning a polished silicon surface is disclosed, the method including steps leading to an organic monolayer on at least a part of the silicon surface, the monolayer being functionalized in specific desired locations. The method can be used to produce a device comprising one or more FET structures, the gate of the FET being formed by the functionalized organic monolayer. The functionalized monolayer preferably contains oligosaccharides or oligopeptides which are capable of interacting with biological substance, such that the device acts as a bio-sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.