Substrate meniscus interface and methods for operation
US7513262B2 · kind B2 · utility
11Cited by
62References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 1, 2004 |
| Grant date | Apr 7, 2009 |
| Priority date | — |
| Expiry date | Jan 27, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus for processing a substrate with a fluid meniscus to be applied to a surface of the substrate is provided which includes a docking surface configured to be placed adjacent to an edge of the substrate where the docking surface is in the same plane as the substrate. The docking surface provides a transition interface to allow the fluid meniscus to enter and exit the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.