Method and apparatus for using solution based precursors for atomic layer deposition
US7514119B2 · kind B2 · utility
9Cited by
1References
1Claims
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Key dates
| Filing date | Apr 10, 2006 |
| Grant date | Apr 7, 2009 |
| Priority date | — |
| Expiry date | Jun 27, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/8305
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A unique combination of solution stabilization and delivery technologies with special ALD operation is provided. A wide range of low volatility solid ALD precursors dissolved in solvents are used. Unstable solutes may be stabilized in solution and all of the solutions may be delivered at room temperature. After the solutions are vaporized, the vapor phase precursors and solvents are pulsed into a deposition chamber to assure true ALD film growth.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.