Lithographic apparatus and device manufacturing method
US7518705B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2006 |
| Grant date | Apr 14, 2009 |
| Priority date | — |
| Expiry date | May 10, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70283
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam; a support constructed to support a first and a second patterning device, each patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the illumination system includes a radiation beam path adaptation device, wherein the adaptation device is configured to adapt a radiation beam path to allow subsequent projections of a pattern of the first patterning device and a pattern of the second patterning device during a single scanning movement of the patterning device support.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.