Magnetic monitoring of a Faraday cup for an ion implanter
US7521691B2 · kind B2 · utility
2Cited by
4References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 8, 2006 |
| Grant date | Apr 21, 2009 |
| Priority date | — |
| Expiry date | Oct 1, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31703
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
This disclosure provides an approach for magnetic monitoring of a Faraday cup for an ion implanter. In this disclosure, there is a vacuum chamber and a Faraday cup located within the vacuum chamber. The Faraday cup is configured to move within the path of an ion beam entering the vacuum chamber. A magnetic monitor located about the vacuum chamber, is configured to distinguish a magnetic field associated with the Faraday cup from stray magnetic fields.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.