Inventor · Rowley, MA, US

Jay T. Scheuer

28Patents
5h-index
54Co-inventors
72Inventor score

Filing activity: Jan 16, 2002 → May 27, 2022

Most-cited inventions

PatentTitleAreaCited byStatus
US7126808B2 Wafer platen equipped with electrostatic clamp, wafer backside gas cooling, and high voltage operation capability for plasma doping Emerging Cross-Sectional Technologies 56 Expired
US6791097B2 Adjustable conductance limiting aperture for ion implanters Electricity 10 Expired
US7132672B2 Faraday dose and uniformity monitor for plasma based ion implantation Electricity 9 Expired
US9685298B1 Apparatus and method for contamination control in ion beam apparatus Electricity 6 Active
US8142607B2 High density helicon plasma source for wide ribbon ion beam generation Electricity 5 Active
US8330127B2 Flexible ion source Electricity 5 Active
US9761410B2 Apparatus and method for in-situ cleaning in ion beam apparatus Electricity 4 Active
US7878145B2 Monitoring plasma ion implantation systems for fault detection and process control Electricity 4 Active
US8590485B2 Small form factor plasma source for high density wide ribbon ion beam generation Electricity 3 Active
US7999479B2 Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control Emerging Cross-Sectional Technologies 3 Active
US11127557B1 Ion source with single-slot tubular cathode Electricity 2 Active
US9805931B2 Liquid immersion doping Electricity 2 Active
US10522330B2 In-situ plasma cleaning of process chamber components Electricity 2 Active
US7521691B2 Magnetic monitoring of a Faraday cup for an ion implanter Electricity 2 Active
US9187832B2 Extended lifetime ion source Electricity 1 Active
US7622722B2 Ion implantation device with a dual pumping mode and method thereof Electricity 1 Active
US10410844B2 RF clean system for electrostatic elements Electricity 1 Active
US11810746B2 Variable thickness ion source extraction plate Electricity 0 Active
US10818469B2 Cylindrical shaped arc chamber for indirectly heated cathode ion source Electricity 0 Active
USD1051838S1 Single-slot tubular cathode General 0 Active
US11037758B2 In-situ plasma cleaning of process chamber components Electricity 0 Active
US11631567B2 Ion source with single-slot tubular cathode Electricity 0 Active
US11495434B2 In-situ plasma cleaning of process chamber components Electricity 0 Active
US11437215B2 Electrostatic filter providing reduced particle generation Electricity 0 Active
US12191113B2 Systems and methods for optimizing full horizontal scanned beam distance Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.