Metrology system with spectroscopic ellipsometer and photoacoustic measurements
US7522272B2 · kind B2 · utility
4Cited by
19References
4Claims
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Key dates
| Filing date | Jul 24, 2007 |
| Grant date | Apr 21, 2009 |
| Priority date | — |
| Expiry date | Jul 24, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/1725
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical system includes both a microspot broadband spectroscopic ellipsometer and a photoacoustic film thickness measurement system that are supplied laser light by the same laser light source. One of the systems makes a measurement, the result of which is used to adjust a parameter of the other system; e.g. the ellipsometer measures thickness and the photoacoustic system uses the thickness result to measure the speed of sound. In one version, the ellipsometer converts the laser beam to a broad-spectrum beam that provides higher intensity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.