Charged particle beam system and a method for inspecting a sample
US7525091B2 · kind B2 · utility
1Cited by
4References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2006 |
| Grant date | Apr 28, 2009 |
| Priority date | — |
| Expiry date | Feb 16, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2826
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method and system for inspecting an inspected object. The system includes: a detector adapted to detect charged particles scattered from a sample; a magnetic lens adapted to generate a magnetic field such as to direct a charge particle beam towards a sample and an first electrode positioned very close to an inspected object, wherein the first electrode comprises a very thin portion that defines a narrow aperture through which the charged particle beam can propagate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.