Monitoring apparatus and method particularly useful in photolithographically
US7525634B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2007 |
| Grant date | Apr 28, 2009 |
| Priority date | — |
| Expiry date | Oct 25, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8867
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.