Photoacid generators, resist compositions, and patterning process
US7527912B2 · kind B2 · utility
31Cited by
38References
15Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 27, 2007 |
| Grant date | May 5, 2009 |
| Priority date | — |
| Expiry date | Nov 2, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/126
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation.RC(═O)R1—COOCH(CF3)CF2SO3−H+ (1a)R is hydroxyl, alkyl, aryl, hetero-aryl, alkoxy, aryloxy or hetero-aryloxy, R1 is a divalent organic group which may have a heteroatom (O, N or S) containing substituent, or R1 may form a cyclic structure with R. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.