Lithographic apparatus and method for calibrating the same
US7528965B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2007 |
| Grant date | May 5, 2009 |
| Priority date | — |
| Expiry date | Oct 29, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7019
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.