Microlithographic projection exposure apparatus

US7532306B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Aurelian Dodoc · Heidenheim an der Brenz, DE
• Karl-Heinz Schuster · Oberkochen, DE
• Joerg Mallmann · Boppard, DE
• Wilhelm Ulrich · Aalen, DE
• Hans-Juergen Rostalski · Oberkochen, DE

Key dates

• Filing date: Aug 13, 2004
• Grant date: May 12, 2009
• Expiry date: Feb 11, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70983
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.