Polymer, resist composition, and patterning process
US7537880B2 · kind B2 · utility
146Cited by
4References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 3, 2007 |
| Grant date | May 26, 2009 |
| Priority date | — |
| Expiry date | Oct 3, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.