Lithographic apparatus and methods for use thereof
US7538875B2 · kind B2 · utility
1Cited by
3References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2004 |
| Grant date | May 26, 2009 |
| Priority date | — |
| Expiry date | Jun 15, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70591
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for determining a polarization state of light passed through the projection lens of a lithographic apparatus is described. Polarizing structures are disposed on an object side of the projection lens of the lithographic apparatus. By measuring light that has passed through the polarizing structures information regarding the polarization characteristics of the projection lens can be determined.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.