Gate electrode structures
US7541650B2 · kind B2 · utility
5Cited by
13References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2007 |
| Grant date | Jun 2, 2009 |
| Priority date | — |
| Expiry date | Oct 27, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/28202
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Gate electrode structures used in field effect transistors and integrated circuits and methods of manufacture are disclosed. Improved work function and threshold modulation are provided by the methods and structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.