System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode
US7542013B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2005 |
| Grant date | Jun 2, 2009 |
| Priority date | — |
| Expiry date | Jun 22, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70116
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method for patterning a beam of radiation based on a pupil field distribution. In an embodiment, the distribution of the field in an area of the pupil plane affecting an image and an illumination mode are selected so as to render an image with desired characteristics. Additionally and/or alternatively, an illumination mode is selected so as to render an image with desired characteristics. The distribution of the field in an area of the pupil plane affecting an image is then realized using the spatial light modulator The system and method include using an illumination system, a pattern generator, and a projector. The illumination system supplies a beam of radiation. The pattern generator patterns the beam of radiation based on a data set corresponding to a field distribution in a pupil plane. The projector projects the patterned beam onto a target portion of an object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.