Patent · US Active

Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus

US7542217B2 · kind B2 · utility

0Cited by

29References

24Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Wolfgang Singer · Aalen, DE
Markus Deguenther · Aalen, DE
Birgit Kuerz · Aalen, DE
Rafael Egger · Munich, DE
Johannes Wangler · Oberkochen, DE
Manfred Maul · Aalen, DE

Key dates

Filing date	Dec 17, 2004
Grant date	Jun 2, 2009
Priority date	—
Expiry date	Jan 16, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70183
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus includes a first beam reshaping element having a first beam reshaping surface and a second beam reshaping element having a second beam reshaping surface which faces the first beam reshaping surface. The two beam reshaping surfaces are rotationally symmetrical with respect to an optical axis of the beam reshaping unit. At least the first beam reshaping surface has a concavely or convexly curved region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.