Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US7545479B2 · kind B2 · utility
59Cited by
23References
4Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 11, 2007 |
| Grant date | Jun 9, 2009 |
| Priority date | — |
| Expiry date | May 11, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70733
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system configured to project a patterned beam onto a target portion of the substrate, liquid being provided to a space between the projection system and the substrate, and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. The shutter is separable from the remainder of the apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.