Lithographic apparatus and device manufacturing method
US7545481B2 · kind B2 · utility
33Cited by
31References
50Claims
0Family size
Assignees
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Key dates
| Filing date | Nov 24, 2003 |
| Grant date | Jun 9, 2009 |
| Priority date | — |
| Expiry date | Oct 28, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.