Paul Graupner
11Patents
5h-index
22Co-inventors
62Inventor score
Filing activity: Sep 19, 2002 → Apr 24, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7433015B2 | Lithographic apparatus and device manufacturing method | Physics | 35 | Expired |
| US7545481B2 | Lithographic apparatus and device manufacturing method | Physics | 33 | Expired |
| US6678240B2 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements | Physics | 14 | Expired |
| US7715107B2 | Optical element for correction of aberration, and a lithographic apparatus comprising same | Physics | 12 | Active |
| US6934011B2 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements | Physics | 5 | Expired |
| US8174674B2 | Lithographic apparatus and device manufacturing method | Physics | 4 | Active |
| US9146475B2 | Projection exposure system and projection exposure method | Physics | 3 | Active |
| US7301622B2 | Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements | Physics | 2 | Expired |
| US8472006B2 | Lithographic apparatus and device manufacturing method | Physics | 0 | Active |
| US9285685B2 | Lithographic apparatus and device manufacturing method | Physics | 0 | Active |
| US8570486B2 | Lithographic apparatus and device manufacturing method | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.