Vaporizing apparatus and semiconductor processing system
US7547003B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 2007 |
| Grant date | Jun 16, 2009 |
| Priority date | — |
| Expiry date | Dec 18, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S261/65
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vaporizing apparatus for generating a process gas from a liquid material includes a vaporizing container defining a vaporizing space of the vaporizing apparatus; an injector connected to the vaporizing container to spray the liquid material in an atomized state into the vaporizing space; and a heater attached to the vaporizing container to heat the liquid material sprayed in the vaporizing space. The vaporizing apparatus further includes a gas delivery passage connected to the vaporizing container to output from the vaporizing space a generation gas generated from the liquid material; a filter disposed inside the gas delivery passage or between the gas delivery passage and the vaporizing space to trap mist contained in the generation gas; and an infrared irradiation mechanism configured to irradiate the filter with infrared rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.