Method of making and apparatus having polishing pad with window
US7547243B2 · kind B2 · utility
7Cited by
29References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2007 |
| Grant date | Jun 16, 2009 |
| Priority date | — |
| Expiry date | Aug 17, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B49/12
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.