Lithographic apparatus and device manufacturing method
US7548302B2 · kind B2 · utility
6Cited by
34References
45Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 22, 2007 |
| Grant date | Jun 16, 2009 |
| Priority date | — |
| Expiry date | Jan 22, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.