Patent · US Active

Systems and methods for determining width/space limits for mask layout

US7550237B2 · kind B2 · utility

1Cited by
2References
9Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 19, 2005
Grant dateJun 23, 2009
Priority date—
Expiry dateMay 31, 2027

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/84
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Systems for determining width/space limits for product mask layouts. A mask writer generates a first pattern on a test mask corresponding to a test mask layout. A lithography tool generates a second pattern on a wafer corresponding to a first pattern on a test mask by a lithography process using a preset exposure dose. A metrology tool measures widths of the first and second pattern. A controller determines a width/space limit for the product mask layout according to the width difference between the first and second pattern.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.