Device for adjusting the illumination dose on a photosensitive layer
US7551263B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 13, 2006 |
| Grant date | Jun 23, 2009 |
| Priority date | — |
| Expiry date | Feb 13, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70558
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A device for adjusting the illumination dose on a photosensitive layer in a microlithographic projection exposure apparatus has a plurality of stop elements which are, in a direction perpendicularly to a scanning direction of the apparatus, arranged next to one another. Each stop element has an outer surface that absorbs substantially all projection light impinging thereon, and a substantially rectangular circumference. Each stop element furthermore has at least one recess in its circumference or at least one opening through which projection light is allowed to pass. A drive unit individually displaces the stop elements along the scanning direction into a light field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.