Patent · US Active

Contact material and system for ultra-clean applications

US7551265B2 · kind B2 · utility

4Cited by
22References
38Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 1, 2004
Grant dateJun 23, 2009
Priority date
Expiry dateMay 19, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/135
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Techniques for minimizing contamination by particles that wear off of components that come into and out of contact with each other. The invention involves forming at least one of the components out of a magnetic material so that the particles that wear off of the component are magnetic themselves. Then a magnetic field is used to attract the particles. In one embodiment, the particles are attracted to and collected by a magnet. In this way, the particles are drawn away from any components that might be contaminated. In some embodiments, the magnetic component is also magnetized. In other embodiments, a magnet is placed in contact with the magnetic component. In other embodiments, each of the components that come into contact with each other are formed of a magnetic material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.