Ion sources and methods for generating an ion beam with a controllable ion current density distribution
US7557362B2 · kind B2 · utility
7Cited by
36References
34Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 26, 2007 |
| Grant date | Jul 7, 2009 |
| Priority date | — |
| Expiry date | Jan 24, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/083
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Ion sources and methods for generating an ion beam with a controllable ion current density distribution. The ion source includes a discharge chamber and an electromagnet adapted to generate a magnetic field for changing a density distribution of the plasma inside the discharge chamber and, thereby, to change the ion current density distribution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.