Defect inspection apparatus and defect inspection method
US7557912B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 2008 |
| Grant date | Jul 7, 2009 |
| Priority date | — |
| Expiry date | Aug 11, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/956
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and a method for defect inspection enables a reduction in the amount of noise light from an underlying layer and a good defect inspection reliably. The apparatus includes an illumination device that irradiates, with illumination light, a substrate to be inspected including a resist layer having cyclic patterns formed on the upper layer, and an optical image forming system that forms an image of the substrate to be inspected according to light that emerges from the substrate to be inspected by the irradiation with illumination light. The wavelength of the illumination light is set so that intensity of the light from the surface of the resist layer, among the light emerged from the substrate to be inspected, is greater than that of light that has passed through the surface of the cyclic pattern layer formed below the resist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.