Method and installation for analyzing an integrated circuit
US7560940B2 · kind B2 · utility
1Cited by
4References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 30, 2005 |
| Grant date | Jul 14, 2009 |
| Priority date | — |
| Expiry date | Sep 30, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/311
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and installation for analyzing an integrated circuit. The method includes, for a plurality of surface points of the integrated circuit, the following steps: applying a laser radiation, in one point of the surface of the integrated circuit; exciting the circuit; collecting the response of the circuit to the excitation; calculating the propagation time intervening between the excitation time and the response-collecting time; and creating an image of the integrated circuit showing a value representing the propagation time at each point of laser radiation application.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.