High power excimer laser with a pulse stretcher
US7564888B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 23, 2007 |
| Grant date | Jul 21, 2009 |
| Priority date | — |
| Expiry date | May 23, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/034
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.