Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
US7565219B2 · kind B2 · utility
5Cited by
21References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2003 |
| Grant date | Jul 21, 2009 |
| Priority date | — |
| Expiry date | Nov 1, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7092
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method according to one embodiment of the invention relates to determining at least one parameter of a model that provides information about a position of an object. The object has a plurality of alignment marks of which desired positions are known. The method includes measuring a plurality of positional parameters for each alignment mark. Based on the measured plurality of positional parameters, which are weighted with weighing coefficients, at least one parameter of the model of the object is determined. The numerical value of each weighing coefficient is determined together with the at least one parameter of the model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.