Systems and methods for minimizing scattered light in multi-SLM maskless lithography
US7567368B2 · kind B2 · utility
2Cited by
22References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2005 |
| Grant date | Jul 28, 2009 |
| Priority date | — |
| Expiry date | Sep 29, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70941
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.