Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process
US7569326B2 · kind B2 · utility
79Cited by
2References
11Claims
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Key dates
| Filing date | Oct 25, 2007 |
| Grant date | Aug 4, 2009 |
| Priority date | — |
| Expiry date | Jan 16, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is derived.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.